> For the complete documentation index, see [llms.txt](https://krict-data.gitbook.io/perovskite-solar-cell-docs/llms.txt). Markdown versions of documentation pages are available by appending `.md` to page URLs; this page is available as [Markdown](https://krict-data.gitbook.io/perovskite-solar-cell-docs/recipes-template/details.md).
# Details
## 1. TCO
Description: TCO (Transparent Conductive Oxide) material used as an electrode
Format: Text string
Default: None
Examples: ITO; FTO; IZO
## 2. Blocking/buffer layer
: Blocking layer(for n-i-p structure) or buffer layer(for p-i-n structure) between electrode and charge transfer layer, especially for electron transfer layer
### 2-1. Material
#### 2-1-1. Material
Description: Material used for blocking layer or buffer layer
Format: Text string
Default: None
Examples: TiO2; BCP; LiF
#### 2-1-2. Concentration
Description: Concentration of material used for blocking layer or buffer layer
Format: Number
Default: None
Examples:
#### 2-1-3. Concentration Unit
Description: Unit of concentration of material used
Format: Text string
Default: None
Examples: mg/ml
#### 2-1-4. Quantity (ml)
Description: Quantity of material used (unit : ml)
Format: Number
Default: None
Examples: 0.2; 0.5
### 2-2. Solvent : (multiple solvents possible)
#### 2-2-1. Material
Description: Solvent used for blocking layer or buffer layer
Format: Text string
Default: None
Examples: DMF; DMSO
#### 2-2-2. Volume (ml)
Description: Amount of solvent used (unit: ml)
Format: Number
Default: None
Examples: 0.2; 0.5
### 2-3. Spin coating
#### 2-3-1. Type
Description: method of spin coating
Format: Text string
Default: None
Examples: drop\&run; dynamic
#### 2-3-2. RPM
Description: RPM value of spin coater
Format: Number
Default: None
Examples: 2000; 5000
#### 2-3-3. Time(s)
Description: operating time (unit: sec) of spin coater
Format: Number
Default: None
Examples: 20; 50
### 2-4. Vacuum suction time(s)
Description: vacuum suction time (unit: sec) after spin coating
Format: Number
Default: None
Examples:
### 2-5. Annealing
#### 2-5-1. Temperature(ºC)
Description: Annealing Temperature (unit: ºC) for the Blocking lay
Format: Number
Default: None
Examples: 180
#### 2-5-2. Time(min)
Description: Annealing time (unit: min) for the Blocking lay
Format: Number
Default: None
Examples: 30; 50
### 2-6. Module : for blocking layer or buffer layer
#### 2-6-1. Type
Description: Method to coat large-area solar cell module
Format: Text string
Default: None
Examples: Bar coating; Slot die
#### 2-6-2. gap (µm)
Description: gap between the bar and the substrate
Format: Number
Default: None
Examples:
#### 2-6-3. coating speed (mm/s)
Description: Moving speed of the bar during the coating
Format: Number
Default: None
Examples:
#### 2-6-4. feeding amount (µl)
Description: Amount of the solution loaded for the coating
Format: Number
Default: None
Examples:
### 2-7. Thermal evaporation : for blocking layer or buffer layer
#### 2-7-1. vacuum evaporation-thickness (nm)
Description: Thickness of the blocking thin film after thermal evaporation
Format: Number
Default: None
Examples: 35; 30
#### 2-7-2. Evaporation rate (Å/s)
Description: (average) Evaporation rate (It can be calculated by dividing the thickness of a thin film by the duration time of the process.)
Format: Number
Default: None
Examples: 0.1; 0.3
#### 2-7-3. Vacuum pressure (uTorr)
Description: Pressure in a processing chamber during thermal evaporation
Format: Number
Default: None
Examples: 1; 2; 0.97
## 3. Surface Treatment1
Description: surface treatment between Blocking layer and ETL (charge transfer layer)
Format: Text string
Default: None
Examples: air\_exposure; UV-ozone; Plasma
## 4. ETL
### 4-1. Material : for ETL
#### 4-1-1. Material
Description: Material used for ETL
Format: Text string
Default: None
Examples: C60; SnO2; PCBM; TiO2
#### 4-1-2. Concentration
Description: Concentration of material used for ETL
Format: Number
Default: None
Examples: 3;5
#### 4-1-3. Concentration Unit
Description: Unit of concentration of material used
Format: Text string
Default: None
Examples: mg/ml
#### 4-1-4. Quantity (ml)
Description: Quantity of material used (unit: ml)
Format: Number
Default: None
Examples: 0.2; 0.5
### 4-2. Solvent : (multiple solvents possible) : for ETL
#### 4-2-1. Material
Description: Solvent used for ETL
Format: Text string
Default: None
Examples: DMF; DMSO
#### 4-2-2. Volume (ml)
Description: Amount of solvent used (unit: ml)
Format: Number
Default: None
Examples: 0.2; 0.5
### 4-3. Spin coating : for ETL
#### 4-3-1. Type
Description: method of spin coating for ETL
Format: Text string
Default: None
Examples: drop\&run; dynamic
#### 4-3-2. RPM
Description: RPM value of spin coater
Format: Number
Default: None
Examples: 2000; 5000
#### 4-3-3. Time(s)
Description: operating time (unit: sec) of spin coater
Format: Number
Default: None
Examples: 20; 50
### 4-4. Vacuum suction time(s) : for ETL
Description: vacuum suction time (unit: sec) after spin coating
Format: Number
Default: None
Examples:
### 4-5. Annealing : for ETL
#### 4-5-1. Temperature (ºC)
Description: Annealing Temperature (unit: ºC)
Format: Number
Default: None
Examples: 180
#### 4-5-2. Time(min)
Description: Annealing time (unit: min)
Format: Number
Default: None
Examples: 30; 50
### 4-6. ETL doping
#### 4-6-1. Material
Description: material for ETL doping
Format: Text string
Default: None
Examples:
#### 4-6-2. Volume (ul)
Description: Amount of material used (unit: ul) for ETL doping
Format: Number
Default: None
Examples:
### 4-7. Module : for ETL
#### 4-7-1. Type
Description: Method to coat large-area solar cell module
Format: Text string
Default: None
Examples: Bar coating; Slot die
#### 4-7-2. gap (µm)
Description: gap between the bar and the substrate
Format: Number
Default: None
Examples:
#### 4-7-3. coating speed (mm/s)
Description: Moving speed of the bar during the coating
Format: Number
Default: None
Examples:
#### 4-7-4. feeding amount (µl)
Description: Amount of the solution loaded for the coating
Format: Number
Default: None
Examples:
### 4-8. Thermal evaporation: for ETL
#### 4-8-1. vacuum evaporation-thickness (nm)
Description: Thickness of the thin film after thermal evaporation
Format: Number
Default: None
Examples: 35; 30
#### 4-8-2. Evaporation rate (Å/s)
Description: (average) Evaporation rate (It can be calculated by dividing the thickness of a thin film by the duration time of the process.)
Format: Number
Default: None
Examples: 0.1; 0.3
#### 4-8-3. Vacuum pressure (uTorr)
Description: Pressure in a processing chamber during thermal evaporation
Format: Number
Default: None
Examples: 1; 2; 0.97
### 4-9. Chemical Bath Deposition: for ETL
#### 4-9-1. Solution
Description: Solution used for Chemical Bath Deposition
Format: Text string
Default: None
Examples: SnCl22H2O; thioglycolic acid; DI water; HCl; Urea
#### 4-9-2. Quantity (ml)
Description: Amount of solution used (unit: ml)
Format: Number
Default: None
Examples: 10
#### 4-9-3. Bath annealing Temperature (ºC)
Description: Chemical Bath annealing Temperature (unit: ºC) for ETL
Format: Number
Default: None
Examples: 90
#### 4-9-4. Bath annealing Time(hr)
Description: Chemical Bath annealing time (unit: hr) for ETL
Format: Number
Default: None
Examples: 30; 50
### 4-10. Sputtering : for ETL
#### 4-10-1. Target material
Description: Sputtering target material for ETL
Format: Text string
Default: None
Examples: SnO2; TiO2
#### 4-10-2. Base pressure (uTorr)
Description: Pressure of the sputtering chamber before the process
Format: Number
Default: None
Examples: 1
#### 4-10-3. Working pressure (mTorr)
Description: Pressure of the sputtering chamber during the process
Format: Number
Default: None
Examples: 1
#### 4-10-4. Ar/O2 ratio
Description: Ratio of Ar and O during the sputtering process
Format: Number
Default: None
Examples:
#### 4-10-5. Deposition rate (Å/s)
Description: (average) Deposition rate (It can be calculated by dividing the thickness of a thin film by the duration time of the process.)
Format: Number
Default: None
Examples: 1
#### 4-10-6. Deposition thickness (nm)
Description: Thickness of the solar cell film after sputtering process
Format: Number
Default: None
Examples:
#### 4-10-7. RF power (W)
Description: RF power that allows the plasma to hit the target
Format: Number
Default: None
Examples: 10
#### 4-10-8. DC power current (mA)
Description: DC current (unit: mA) that allows the plasma to hit the target
Format: Number
Default: None
Examples: 10
#### 4-10-9. DC power voltage (V)
Description: DC voltage (unit: V) that allows the plasma to hit the target
Format: Number
Default: None
Examples: 1
## 5. ETL Treatment
### 5-1. Material : for ETL Treatment
#### 5-1-1. Material
Description: Material used for ETL Treatment
Format: Text string
Default: None
Examples: KCl; MACl
#### 5-1-2. Concentration
Description: Concentration of material used for ETL Treatment
Format: Number
Default: None
Examples:
#### 5-1-3. Concentration Unit
Description: Unit of concentration of material used for ETL Treatment
Format: Text string
Default: None
Examples: mg/ml
#### 5-1-4. Quantity (ml)
Description: Quantity of material used (unit: ml) for ETL Treatment
Format: Number
Default: None
Examples: 0.2; 0.5
### 5-2. Solvent : (multiple solvent blocks possible) : for ETL Treatment
#### 5-2-1. Material
Description: Solvent used for ETL Treatment
Format: Text string
Default: None
Examples: DMF; DMSO
#### 5-2-2. Volume (ml)
Description: Amount of solvent used (unit: ml) for ETL Treatment
Format: Number
Default: None
Examples: 0.2; 0.5
### 5-3. Spin coating : for ETL Treatment
#### 5-3-1. Type
Description: method of spin coating for ETL Treatment
Format: Text string
Default: None
Examples: drop\&run; dynamic
#### 5-3-2. RPM
Description: RPM value of spin coater
Format: Number
Default: None
Examples: 2000; 5000
#### 5-3-3. Time(s)
Description: operating time (unit: sec) of spin coater
Format: Number
Default: None
Examples: 20; 50
### 5-4. Vacuum suction time(s) : for ETL Treatment
Description: vacuum suction time (unit: sec) after spin coating
Format: Number
Default: None
Examples:
### 5-5. Annealing : for ETL Treatment
#### 5-5-1. . Temperature (ºC)
Description: Annealing Temperature (unit:℃) for ETL Treatment
Format: Number
Default: None
Examples: 180
#### 5-5-2. Time(min)
Description: Annealing time (unit: min) for ETL Treatment
Format: Number
Default: None
Examples: 30; 50
### 5-6. Module : for ETL Treatment
#### 5-6-1. Type
Description: Method to coat large-area solar cell module
Format: Text string
Default: None
Examples: Bar coating; Slot die
#### 5-6-2. gap (µm)
Description: gap between the bar and the substrate
Format: Number
Default: None
Examples:
#### 5-6-3. coating speed (mm/s)
Description: Moving speed of the bar during the coating
Format: Number
Default: None
Examples:
#### 5-6-4. feeding amount (µl)
Description: Amount of the solution loaded for the coating
Format: Number
Default: None
Examples:
### 5-7. Thermal evaporation : for ETL Treatment
#### 5-7-1. vacuum evaporation-thickness (nm)
Description: Thickness of the thin film after thermal evaporation
Format: Number
Default: None
Examples: 35; 30
#### 5-7-2. Evaporation rate (Å/s)
Description: (average) Evaporation rate (It can be calculated by dividing the thickness of a thin film by the duration time of the process.)
Format: Number
Default: None
Examples: 0.1; 0.3
#### 5-7-3. Vacuum pressure (uTorr)
Description: Pressure in a processing chamber during thermal evaporation
Format: Number
Default: None
Examples: 1; 2; 0.97
## 6. Surface Treatment2
Description: surface treatment between ETL (charge transfer layer) and Perovskite
Format: Text string
Default: None
Examples: air\_exposure; UV-ozone; Plasma
## 7. Perovskite
: multiple columns possible depending on the number of steps
### 7-1. Method
Description: method to build a perovskite layer (number of step)
Format: Text string
Default: None
Examples: 1-step; 2-step
### 7-2. Molarity
Description: Molarity (molar concentration) of perovskite solution (unit: mol/L, M)
Format: Number
Default: None
Examples: 1.5; 1.8;
### 7-3. A-site : multiple blocks possible
#### 7-3-1. Material : for A site
Description: Material for A-site
Format: Text string
Default: None
Examples: FA; MA; Cs
#### 7-3-2. Ratio (%)
Description: Ratio of materials that make up A-site (unit: %)
Format: Number
Default: The sum of the ratios of multiple blocks should add up to 100.
Examples: 95; 5
### 7-4. B-site : multiple blocks possible
#### 7-4-1. Material : for B site
Description: Material for B-site
Format: Text string
Default: None
Examples: Pb; Sn
#### 7-4-2. Ratio (%)
Description: Ratio of materials that make up B-site (unit: %)
Format: Number
Default: The sum of the ratios of multiple blocks should add up to 100
Examples: 99; 1
### 7-5. X-site : multiple blocks possible
#### 7-5-1. Material : for X site
Description: Material for X-site
Format: Text string
Default: None
Examples: I; Br
#### 7-5-2. Ratio (%)
Description: Ratio of materials that make up X-site (unit: %)
Format: Number
Default: The sum of the ratios of multiple blocks should add up to 100.
Examples: 95; 5
### 7-6. Solvent : for Perovskite (multiple blocks possible)
#### 7-6-1. Material
Description: Solvent used for Perovskite
Format: Text string
Default: None
Examples: DMF; DMSO
#### 7-6-2. Volume (ml)
Description: Amount of solvent used (unit: ml)
Format: Number
Default: None
Examples: 0.2; 0.5
### 7-7. Additive : for Perovskite (multiple blocks possible)
#### 7-7-1. Material
Description: Material used for Additive of Perovskite
Format: Text string
Default: None
Examples: MACl
#### 7-7-2. Solvent
Description: Solvent for Additive of Perovskite
Format: Text string
Default: None
Examples:
#### 7-7-3. Concentration
Description: Concentration of Solvent for Additive of Perovskite
Format: Number
Default: None
Examples: 1
#### 7-7-4. Concentration Unit
Description: Unit of concentration of Solvent for Additive of Perovskite
Format: Number
Format: Text string
Default: None
Examples: mg/ml
#### 7-7-5. Quantity (mol%)
Description: Quantity of additive solvent used (unit: mol%)
Format: Number
Default: None
Examples: 20
### 7-8. Stirring Time (min)
Description: Stirring Time for dissolving solutes in solvents (unit: min)
Format: Number
Default: None
Examples: 120
### 7-9. Antisolvent : for Perovskite
#### 7-9-1. Material
Description: Antisolvent used for Perovskite
Format: Text string
Default: None
Examples: CB
#### 7-9-2. Quantity (µl)
Description: Amount of Antisolvent used (unit: µl)
Format: Number
Default: None
Examples: 300
#### 7-9-3. Dripping time (s)
Description: Dripping time of Antisolvent (unit: sec)
Format: Number
Default: None
Examples: 20
### 7-10. Spin coating : for Perovskite
#### 7-10-1. Type
Description: method of spin coating
Format: Text string
Default: None
Examples: drop\&run; dynamic
#### 7-10-2. RPM
Description: RPM value of spin coater
Format: Number
Default: None
Examples: 2000; 5000
#### 7-10-3. Time(s)
Description: operating time (unit: sec) of spin coater
Format: Number
Default: None
Examples: 20; 50
### 7-11. Annealing : for Perovskite
#### 7-11-1. Temperature (ºC)
Description: Annealing Temperature (unit : ºC)
Format: Number
Default: None
Examples: 100
#### 7-11-3. Time(min)
Description: operating time (unit: min) of Annealing
Format: Number
Default: None
Examples: 60
### 7-12. Atmosphere
#### 7-12-1. Type
Description: type of atmosphere (N2 or air) used during the deposition of a perovskite layer
Format: Text string
Default: None
Examples: N2
#### 7-12-1. Temperature (ºC)
Description: Temperature during the deposition of a perovskite layer (unit: ºC)
Format: Number
Default: None
Examples: 18.6
#### 7-12-3. Humidity (RH%)
Description: Humidity during the deposition of a perovskite layer (unit: RH%)
Format: Number
Default: None
Examples:
### 7-13. Assist : for Perovskite
#### 7-13-1. Type
Description: A method of promoting perovskite crystallization by using a hot air gun to heat blow during spin coating process
Format: Text string
Default: None
Examples: hot air assist
#### 7-13-2. Temperature (ºC)
Description: Temperature of hot air gun (unit: ºC)
Format: Number
Default: None
Examples: 200
#### 7-13-3. Assist start time (s)
Description: Time of start the heat flow using hot air gun (unit: sec)
Format: Number
Default: None
Examples: 13
#### 7-13-4. Total assist time (s)
Description: Total time of heat flow using hot air gun (unit: sec)
Format: Number
Default: None
Examples: 10
### 7-14. Module : for Perovskite
#### 7-14-1. Type
Description: Method to coat large-area solar cell module
Format: Text string
Default: None
Examples: Bar coating; Slot die
#### 7-14-2. gap (µm)
Description: gap between the bar and the substrate
Format: Number
Default: None
Examples:
#### 7-14-3. coating speed (mm/s)
Description: Moving speed of the bar during the coating
Format: Number
Default: None
Examples:
#### 7-14-4. feeding amount (µl)
Description: Amount of the solution loaded for the coating
Format: Number
Default: None
Examples:
### 7-15. Thermal evaporation : for Perovskite
#### 7-15-1. vacuum evaporation-thickness (nm)
Description: Thickness of the thin film after thermal evaporation
Format: Number
Default: None
Examples: 35; 30
#### 7-15-2. Evaporation rate (Å/s)
Description: (average) Evaporation rate (It can be calculated by dividing the thickness of a thin film by the duration time of the process.)
Format: Number
Default: None
Examples: 0.1; 0.3
#### 7-15-3. Vacuum pressure (uTorr)
Description: Pressure in a processing chamber during thermal evaporation
Format: Number
Default: None
Examples: 1; 2; 0.97
## 8. Perovskite Treatment
### 8-1. Material : for Perovskite Treatment
#### 8-1-1. Material
Description: Material used for Perovskite Treatment
Format: Text string
Default: None
Examples: PEAl, MACl
#### 8-1-2. Concentration
Description: Concentration of material used for Perovskite Treatment
Format: Number
Default: None
Examples:3
#### 8-1-3. Concentration Unit
Description: Unit of concentration of material used
Format: Text string
Default: None
Examples: mg/ml
#### 8-1-4. Quantity (ml)
Description: Quantity of material used (unit: ml)
Format: Number
Default: None
Examples: 0.2
### 8-2. Solvent : for Perovskite Treatment (multiple blocks possible)
#### 8-2-1. Material
Description: Solvent used for Perovskite Treatment
Format: Text string
Default: None
Examples: DMSO
#### 8-2-2. Volume (ml)
Description: Amount of solvent used (unit: ml)
Format: Number
Default: None
Examples: 0.2; 0.5
### 8-3. Spin coating : for Perovskite Treatment
#### 8-3-1. Type
Description: method of spin coating for Perovskite Treatment
Format: Text string
Default: None
Examples: drop\&run; dynamic
#### 8-3-2. RPM
Description: RPM value of spin coater
Format: Number
Default: None
Examples: 2000; 5000
#### 8-3-3. Time(s)
Description: operating time (unit: sec) of spin coater
Format: Number
Default: None
Examples: 20; 50
### 8-4. Vacuum suction time(s) : for Perovskite Treatment
Description: vacuum suction time (unit: sec) after spin coating
Format: Number
Default: None
Examples:
### 8-5. Annealing : for Perovskite Treatment
#### 8-5-1. Temperature (ºC)
Description: Annealing Temperature (unit:ºC) for Perovskite Treatment
Format: Number
Default: None
Examples:
#### 8-5-2. Time(min)
Description: Annealing time (unit: min) for Perovskite Treatment
Format: Number
Default: None
Examples:
### 8-6. Module : for Perovskite Treatment
#### 8-6-1. Type
Description: Method to coat large-area solar cell module
Format: Text string
Default: None
Examples: Bar coating; Slot die
#### 8-6-2. gap (µm)
Description: gap between the bar and the substrate
Format: Number
Default: None
Examples:
#### 8-6-3. coating speed (mm/s)
Description: Moving speed of the bar during the coating
Format: Number
Default: None
Examples:
#### 8-6-4. feeding amount (µl)
Description: Amount of the solution loaded for the coating
Format: Number
Default: None
Examples:
### 8-7. Thermal evaporation : for Perovskite Treatment
#### 8-7-1. vacuum evaporation-thickness (nm)
Description: Thickness of the thin film after thermal evaporation
Format: Number
Default: None
Examples: 35; 30
#### 8-7-2. Evaporation rate (Å/s)
Description: (average) Evaporation rate (It can be calculated by dividing the thickness of a thin film by the duration time of the process.)
Format: Number
Default: None
Examples: 0.1; 0.3
#### 8-7-3. Vacuum pressure (uTorr)
Description: Pressure in a processing chamber during thermal evaporation
Format: Number
Default: None
Examples: 1; 2; 0.97
## 9. HTL
### 9-1. Material : for HTL
#### 9-1-1. Material
Description: Material used for HTL
Format: Text string
Default: None
Examples: PTAA; spiro-OMeTAD; me-4pacz
#### 9-1-2. Concentration
Description: Concentration of material used for HTL
Format: Number
Default: None
Examples: 3;5
#### 9-1-3. Concentration Unit
Description: Unit of concentration of material used for HTL
Format: Text string
Default: None
Examples: mg/ml
#### 9-1-4. Quantity (ml)
Description: Quantity of material used (unit: ml) for HTL
Format: Number
Default: None
Examples: 0.2; 0.5
### 9-2. Solvent : multiple blocks possible : for HTL
#### 9-2-1. Material
Description: Solvent used for HTL
Format: Text string
Default: None
Examples: DMF; DMSO
#### 9-2-2. Volume (ml)
Description: Amount of solvent used (unit: ml)
Format: Number
Default: None
Examples: 0.2; 0.5
### 9-3. Spin coating : for HTL
#### 9-3-1. Type
Description: method of spin coating for HTL
Format: Text string
Default: None
Examples: drop\&run; dynamic
#### 9-3-2. RPM
Description: RPM value of spin coater
Format: Number
Default: None
Examples: 2000; 5000
#### 9-3-3. Time(s)
Description: operating time (unit: sec) of spin coater
Format: Number
Default: None
Examples: 20; 50
### 9-4. Vacuum suction time(s) : for HTL
Description: vacuum suction time (unit: sec) after spin coating
Format: Number
Default: None
Examples:
### 9-5. Annealing : for HTL
#### 9-5-1. Temperature (ºC)
Description: Annealing Temperature (unit: ºC) for HTL
Format: Number
Default: None
Examples: 180
#### 9-5-2. Time(min)
Description: Annealing time (unit: min) for HTL
Format: Number
Default: None
Examples: 30; 50
### 9-6. HTL doping
#### 9-6-1. Material
Description: material for HTL doping
Format: Text string
Default: None
Examples:
#### 9-6-2. Volume (ul)
Description: Amount of material used for HTL doping (unit: ul)
Format: Number
Default: None
Examples: tBP; Li-TFSI
### 9-7. Module : for HTL
#### 9-7-1. Type
Description: Method to coat large-area solar cell module
Format: Text string
Default: None
Examples: Bar coating; Slot die
#### 9-7-2. gap (µm)
Description: gap between the bar and the substrate
Format: Number
Default: None
Examples:
#### 9-7-3. coating speed (mm/s)
Description: Moving speed of the bar during the coating
Format: Number
Default: None
Examples:
#### 9-7-4. feeding amount (µl)
Description: Amount of the solution loaded for the coating
Format: Number
Default: None
Examples:
### 9-8. Thermal evaporation : for HTL
#### 9-8-1. vacuum evaporation-thickness (nm)
Description: Thickness of the thin film after thermal evaporation
Format: Number
Default: None
Examples: 35; 30
#### 9-8-2. Evaporation rate (Å/s)
Description: (average) Evaporation rate (It can be calculated by dividing the thickness of a thin film by the duration time of the process.)
Format: Number
Default: None
Examples: 0.1; 0.3
#### 9-8-3. Vacuum pressure (uTorr)
Description: Pressure in a processing chamber during thermal evaporation
Format: Number
Default: None
Examples: 1; 2; 0.97
## 10. HTL Treatment
### 10-1. Material : for HTL Treatment
#### 10-1-1. Material
Description: Material used for HTL Treatment
Format: Text string
Default: None
Examples: Li-TFSI; BCP
#### 10-1-2. Concentration
Description: Concentration of material used for HTL Treatment
Format: Number
Default: None
Examples:
#### 10-1-3. Concentration Unit
Description: Unit of concentration of material used
Format: Text string
Default: None
Examples: mg/ml
#### 10-1-4. Quantity (ml)
Description: Quantity of material used (unit: ml)
Format: Number
Default: None
Examples: 0.2; 0.5
### 10-2. Solvent : multiple blocks possible: for HTL Treatment
#### 10-2-1. Material
Description: Solvent used for HTL Treatment
Format: Text string
Default: None
Examples: DMF; DMSO
#### 10-2-2. Volume (ml)
Description: Amount of solvent used (unit: ml) for HTL Treatment
Format: Number
Default: None
Examples: 0.2; 0.5
### 10-3. Spin coating : for HTL Treatment
#### 10-3-1. Type
Description: method of spin coating for HTL Treatment
Format: Text string
Default: None
Examples: drop\&run; dynamic
#### 10-3-2. RPM
Description: RPM value of spin coater
Format: Number
Default: None
Examples: 2000; 5000
#### 10-3-3. Time(s)
Description: operating time (unit: sec) of spin coater
Format: Number
Default: None
Examples: 20; 50
### 10-4. Vacuum suction time(s) : for HTL Treatment
Description: vacuum suction time (unit: sec) after spin coating
Format: Number
Default: None
Examples:
### 10-5. Annealing : for HTL Treatment
#### 10-5-1. Temperature (ºC)
Description: Annealing Temperature (unit:℃) for HTL Treatment
Format: Number
Default: None
Examples: 180
#### 10-5-2. Time(min)
Description: Annealing time (unit: min) for HTL Treatment
Format: Number
Default: None
Examples: 30; 50
### 10-6. Module : for HTL Treatment
#### 10-6-1. Type
Description: Method to coat large-area solar cell module
Format: Text string
Default: None
Examples: Bar coating; Slot die
#### 10-6-2. gap (µm)
Description: gap between the bar and the substrate
Format: Number
Default: None
Examples:
#### 10-6-3. coating speed (mm/s)
Description: Moving speed of the bar during the coating
Format: Number
Default: None
Examples:
#### 10-6-4. feeding amount (µl)
Description: Amount of the solution loaded for the coating
Format: Number
Default: None
Examples:
### 10-7. Thermal evaporation : for HTL Treatment
#### 10-7-1. vacuum evaporation-thickness (nm)
Description: Thickness of the thin film after thermal evaporation
Format: Number
Default: None
Examples: 35; 30
#### 10-7-2. Evaporation rate (Å/s)
Description: (average) Evaporation rate (It can be calculated by dividing the thickness of a thin film by the duration time of the process.)
Format: Number
Default: None
Examples: 0.1; 0.3
#### 10-7-3. Vacuum pressure (uTorr)
Description: Pressure in a processing chamber during thermal evaporation
Format: Number
Default: None
Examples: 1; 2; 0.97
## 11. Anode metal
### 11-1. Anode Metal : Material for Anode
Description: Material’s name used for Anode
Format: Text string
Default: None
Examples: Ag; Au
## 12. Miscellaneous
### 12-1 Note
Description: notes for the sample
Format: Text string
Default: None
Examples
### 12-2. AR
Description: Anti-Reflection coating (off:0, on:1)
Format: Number
Default:0
Examples: 0; 1
### 12-3. Type
Description: solar cell type, such as unit\_cell or module
Format: Text string
Default: None
Examples: unit\_cell; module
### 12-4. Device Type
Description: device type, such as p-i-n or n-i-p
Format: Text string
Default: None
Examples: p-i-n; n-i-p
### 12-5. Temperature (ºC)
Description: Temperature of device fabrication environment (unit: ºC)
Format: Number
Default: None
Examples:
### 12-6. Humidity (%)
Description: Humidity of device fabrication environment (unit: %)
Format: Number
Default: None
Examples:
### 12-7. Cell Dimension (cm2)
Description: cell dimension (must be written if JV curve doesn’t have an information for cell dimension)
Format: Number
Default: None
Examples: 0.64